Staff: P. Petrik, M. Fried, T. Lohner, B. Fodor, E. Agocs, J. Nador, B. Kalas,

Publications, Projects, Equipment, History, Contact, Cooperations, Staff

Biomaterials and Bioellipsometry

Plasmon-enhanced two-channel, multi-angle in situ spectroscopic ellipsometry

Combination of ellipsometry with waveguide interferometry

Multiple angle of incidence, spectroscopic, plasmon-enhanced, internal reflection ellipsometry for the characterization of solid-liquid interface processes

In-depth characterization and computational 3D reconstruction of flagellar filament protein layer structure based on in situ spectroscopic ellipsometry measurements

In situ ellipsometric study of surface immobilization of flagellar filaments

In situ spectroscopic ellipsometry study of protein immobilization on different substrates using liquid cells


Expanded beam spectro-ellipsometry for big area on-line monitoring

Fast optical monitoring of thin films on large surfaces


  Substrate damage by radiofrequency sputtering

Ellipsometry of oxidized porous Si in the ultraviolet-visible-mid infrared spectral range

Spectroscopic ellipsometry of columnar porous Si thin films and Si nanowires

Photonic structures

Fourier ellipsometry – an ellipsometric approach to Fourier scatterometry

Optical Models for the Characterization of Silica Nanosphere Monolayers Prepared by the Langmuir-Blodgett Method Using Ellipsometry in the Quasistatic Regime

Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent Fourier scatterometry

Resolving lateral and vertical structures by ellipsometry using wavelength range scan


Expanded-beam optical mapping for large-are photovoltaics

In line optical mapping for roll-to-roll thin-film photovoltaics

Optical modeling

Effective medium modeling of finite element-generated surface roughness

Approaches to calculate the dielectric function of ZnO around the band gap

Optical properties

Optical properties of strain modified NaNbO3 thin films

Waveguide characterizations

High-density Er doping with femtosecond laser plasma

Doping silica beyond limits with laser plasma for active photonic materials



Rotating compensator spectroscopic ellipsometer from the Woollam company in the wavelenth range of 190-1700 nm with an automatic goniometer and and automatic sample stage. Focusing works down to 0.15 mm. The measurement time is a couple of seconds per spot.

We are continuously developing equipment for large area mapping applications. For more results see section Mapping

Double-monocromator rotating polarizer spectroscopic ellipsometer in the wavelength range of 250-850 nm. The spot size is about 1 mm. Especially well suited for high spectral resolution measurements, for which the speed is not an important requirement. New generations of this ellipsometer is currently developed by Semilab


The activities of the Ellipsometry Laboratory of the Institute for Technical Physics and Materials Science in the Centre for Energy Research of the Hungarian Academy of Sciences (MTA EK MFA) span more than 30 years, dating back to the early ‘80s when Tivadar Lohner started optical characterizations of the crystal damage in ion-implanted single-crystalline silicon. The research of the Laboratory has a unique focus on the investigations of disorder in bulk and thin film materials created by methods including ion implantation and deposition. Optical models have been developed to improve ellipsometric methodology of multi-component material systems in a vertically changing structure. In the past decade the group has been active in the fields of surface characterizations and bioellipsometry as well. The bioellipsometry activities include the development of liquid cells and optical models for the in situ ellipsometric measurement of protein immobilization. Overall, the Ellipsometry Laboratory has published nearly 300 papers and 3 book chapters, participated in numerous international and national projects, and was the co-organizer of the 3rd International Conference on Spectroscopic Ellipsometry. Besides several self-made and commercial ellipsometers, the main tool of the Laboratory is a Woollam M2000DI automatic rotating compensator ellipsometer operating in the wavelength range of 190-1700 nm.


Visiting Address:     H-1121 Budapest, Konkoly Thege Miklós út 29-33, Hungary
Mailing Address:   P.O.Box 49, H-1525 Budapest, Hungary
Phone:   (+36-1) 392-2502
Fax:   (+36-1) 392-2226
Location:   The Ellipsometry Laboratory is located in room 215 of building 26 in the KFKI Campus in Csillebérc. You can reach the campus as described here.



    Péter Petrik, DSc
    Thin films and materials science
    Bioellipsometry, scatterometry

    Miklós Fried, DSc
    Development of mapping ellipsometry, ion implantation,
    backscattering spectrometry, surface modifications, porous silicon,
    surface modifications, porous silicon, materials science for photovoltaics

    Tivadar Lohner, DSc
    Ion implantation, nanostructures, quality management,
    backscattering spectrometry, poly/nanocrystalline semiconductors,
    dielectric thin films, porous silicon

    György Juhász, Dr. Univ.
    Hardware development
    Development of divergent beam mapping ellipsometry

    Emil Agócs, PhD
    Nanostructures, bioellipsometry,
    Ellipsometry of complex,
    nanocrystalline semiconductors

    Judit Nádor, PhD
    Label-free optical metrology,
    Biosensors, bioellipsometry

    Bálint Fodor, PhD student
    Model development for the characterization
    of ordered surface structures

    Benjamin Kalas, student
    Special flow cell desing, interface processes

    Bálint Éles, student
    Ellipsometry, scatterometry

    Enikő Molnár, student

    Alex Szendrei, student

    Alekszej Romanenko, student

    Péter Kozma, PhD
    Development of optical waveguide sensors,
    protein immobilization, in situ bioellipsometry,
    development of liquid cells

    Csaba Major, PhD
    Hardware development
    Mapping ellipsometry

    Olivér Polgár, PhD
    Software development
    Evaluation and parameter search algorithms
    Mapping ellipsometry

    Olivia Kozák, student

    Miklós Dióssy, student
    Tuning of refractive index by nanoparticles

    Milán Janosov, student
    Instrumentation for combined
    ellipsometry and interferometry

    István Mohácsi, student
    Ion implantation
    Modelling of disorder in low energy ion implantation

    Veronika Cotrau, student
    Protein immobilization and in situ bioellipsometry

    Zoltán Betyák, student
    Ion implantation
    Disorder by ion implantation in silicon carbide

    Andrea Németh, student
    Protein immobilization, in situ bioellipsometry

    Tímea Hülber, student
    Protein immobilization, in situ bioellipsometry